Vapor Deposition

Vapor Deposition Techniques

* Physical Vapor Deposition

* Chemical Vapor Deposition

* Physical and Chemical Vapor Deposition (P-CVD)


Typical kinetic energy ranges for various vapor deposition processes are presented below:

	 	   10^6-| eV
			|				-----------------------
		       -|				 Ion Implantation
		   	|
		   10^4-|-------------------------------
			| Ion beam 			-----------------------
		       -| Ion plating      	 	 PECVD
			| Sputtering    		-----------------------
		   10^2-|-------------------------------
			|Glow discharge sputtering/Ion plating
		       -|-------------------------------
			|
		      1-|-------------------------------
			| Conventional CVD/Evaporation
		       -|-------------------------------
			|
		  10^-2-|------------------------------------------------------