From cgl@nimbus.dartmouth.edu Tue Jan 29 16:40:33 2002 Return-Path: Received: from nimbus.dartmouth.edu (nimbus.dartmouth.edu [129.170.16.33]) by thayer.dartmouth.edu (8.11.6/8.11.6) with ESMTP id g0TLeX627342 for ; Tue, 29 Jan 2002 16:40:33 -0500 Received: (from cgl@localhost) by nimbus.dartmouth.edu (8.9.3/8.9.3) id QAA27744 for microeng@thayer.dartmouth.edu; Tue, 29 Jan 2002 16:40:32 -0500 Received: from kronos.mems-exchange.org (kronos.mems-exchange.org [132.151.8.1]) by nimbus.dartmouth.edu (8.9.3/8.9.3) with ESMTP id PAA18206 for ; Tue, 29 Jan 2002 15:53:17 -0500 Received: from localhost ([127.0.0.1] helo=kronos.mems-exchange.org) by kronos.mems-exchange.org with esmtp (Exim 3.12 #1) id 16VfF9-0000yu-00; Tue, 29 Jan 2002 15:52:39 -0500 Received: from [63.72.7.224] (helo=mail.MCMASTER.LOCAL) by kronos.mems-exchange.org with esmtp (Exim 3.12 #1) id 16Vcni-00072C-00 for mems-talk@memsnet.org; Tue, 29 Jan 2002 13:16:10 -0500 content-class: urn:content-classes:message MIME-Version: 1.0 Content-Type: text/plain; charset="iso-8859-1" Content-Transfer-Encoding: 7bit Message-ID: <62102CCF2078D311BE5200508B2CC9573ACA0A@mail.MCMASTER.LOCAL> Thread-Topic: mems-talk digest, Vol 1 #172 - 6 msgs Thread-Index: AcGo5r8rnYaSVlLNTC2N8ZnagiqpyAAB4P4w From: "Mark Shaw" To: Subject: [mems-talk] Negative Resist Sender: mems-talk-admin@memsnet.org Errors-To: mems-talk-admin@memsnet.org X-BeenThere: mems-talk@memsnet.org X-Mailman-Version: 2.0.8 Precedence: bulk Reply-To: mems-talk@memsnet.org List-Help: List-Post: List-Subscribe: , List-Id: General MEMS discussion List-Unsubscribe: , List-Archive: Date: Tue, 29 Jan 2002 13:16:06 -0500 X-Status: X-Keywords: X-UID: 8 Status: RO Dear Peng Jin, I am replying to your question concerning your desire to work with a negative resist that can easily be removed in a standard photoresist stripper....My company, MicroChem Corp, manufactures a negative tone photoresist called SU-8 which is widely used in the MEMS area but up till now has had some issues related to the stripping, especially after electroplating....We have recently developed a release layer that is spin coated onto the seed layer/substrate and baked, then the SU-8 is applied and processed as per normal...A very short development step is then performed to develop out the release layer, in either O2 Plasma or an aqueous developer such as Shipley MF319....The electroplating step can then be performed followed by immersion in either a developing solution (MF319) or a NMP based stripper such as Remover PG or Shipley's 1165 Remover which dissolves the release layer, leaving behind the electroplated feature.... If you have any further questions or if you need additional information including a sample please contact me at 617-965-5511 ext. 308 or via email at mshaw@microchem.com Thanks and best regards, Mark Shaw Technical Sales & Applications Support MicroChem Corp. Hi, friends, In my research project, I need to find a kind of negative photoresist which must be easy to remove by acetone or other chemical solvent. Could anyone give me some idea about it? Thanks. Peng Jin -----Original Message----- From: mems-talk-request@memsnet.org [mailto:mems-talk-request@memsnet.org] Sent: Tuesday, January 29, 2002 12:01 PM To: mems-talk@memsnet.org Subject: mems-talk digest, Vol 1 #172 - 6 msgs Send mems-talk mailing list submissions to mems-talk@memsnet.org To subscribe or unsubscribe via the World Wide Web, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk or, via email, send a message with subject or body 'help' to mems-talk-request@memsnet.org You can reach the person managing the list at mems-talk-admin@memsnet.org When replying, please edit your Subject line so it is more specific than "Re: Contents of mems-talk digest..." Today's Topics: 1. heating up metals (Yahong Yao) 2. RE: Teflon foil. (Heiko van der Linden) 3. Negative Photoresist (Peng Jin) 4. Oil bath (harry .) 5. EEPROM is sensor interface circuits. (li gang) 6. Re: Negative Photoresist (Paolo Bondavalli) --__--__-- Message: 1 From: "Yahong Yao" To: mems-talk@memsnet.org Date: Tue, 29 Jan 2002 04:53:53 Subject: [mems-talk] heating up metals Reply-To: mems-talk@memsnet.org Hello All, When metals are heated up, some change from solid to liquid then to vapor (for example, Au, Al, Ni...), and some change form solid to vapor directly (Cr). I am wondering where I can find a list of such information for commonly used metals. Thanks a lot. Yahong _________________________________________________________________ Send and receive Hotmail on your mobile device: http://mobile.msn.com --__--__-- Message: 2 From: "Heiko van der Linden" To: Subject: RE: [mems-talk] Teflon foil. Date: Tue, 29 Jan 2002 09:13:56 +0100 Organization: MESA+ Research Institute, Twente University Reply-To: mems-talk@memsnet.org Hi Nathalia, Thank you for your kind email. I have sent a message to durafilm to see if they can supply me with the foil I need. Regards, Heiko van der Linden ******************************* MESA+ Research Institute Twente University P.O. Box 217 7500 AE Enschede The Netherlands ******************************* -----Original Message----- From: mems-talk-admin@memsnet.org [mailto:mems-talk-admin@memsnet.org] On Behalf Of Nathalia Sent: Saturday, January 26, 2002 12:34 AM To: mems-talk@memsnet.org Subject: [mems-talk] Teflon foil. Hi Heiko, depending on the teflon you're looking for, Durafilm might have it. Write me an email if you need more info/their webpage. (nathalia@sensors.stanford.edu). Regards, Nathalia http://transducers.stanford.edu _______________________________________________ mems-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.mems-exchange.org/ --__--__-- Message: 3 From: "Peng Jin" To: Date: Tue, 29 Jan 2002 10:33:58 -0000 Subject: [mems-talk] Negative Photoresist Reply-To: mems-talk@memsnet.org Hi, friends, In my research project, I need to find a kind of negative photoresist which must be easy to remove by acetone or other chemical solvent. Could anyone give me some idea about it? Thanks. Peng Jin --__--__-- Message: 4 From: "harry ." To: mems-talk@memsnet.org Date: Tue, 29 Jan 2002 13:58:15 +0000 Subject: [mems-talk] Oil bath Reply-To: mems-talk@memsnet.org Dear MEMS-members, Does anyone know what company can manufacture an etching tank with the circulated oil bath that can keep the solution temperature constant? Thanks! Regards, harry _________________________________________________________________ MSN Photos is the easiest way to share and print your photos: http://photos.msn.com/support/worldwide.aspx --__--__-- Message: 5 From: "li gang" To: mems-talk@memsnet.org Date: Tue, 29 Jan 2002 22:11:34 +0800 Subject: [mems-talk] EEPROM is sensor interface circuits. Reply-To: mems-talk@memsnet.org Dear all, I readed some papers about sensor interface circuits, and found that EEPROM is widely used in them. Could you recommand some papers and books, which state the EEPROM's function in sensor interface circuits in depth? Thanks in advace, Sincerely, Li Gang _________________________________________________________________ Get your FREE download of MSN Explorer at http://explorer.msn.com/intl.asp. --__--__-- Message: 6 Date: Tue, 29 Jan 2002 16:08:19 +0100 From: Paolo Bondavalli Organization: THALES LCR To: mems-talk@memsnet.org Subject: Re: [mems-talk] Negative Photoresist Reply-To: mems-talk@memsnet.org Hi Peng, The best is BCB by DowCorning. I also know PDMS by Wackerchemie or Gelest but it's quite difficult to obtain. Bye Peng Jin a icrit : > Hi, friends, > > In my research project, I need to find a kind of negative photoresist which > must be easy to remove by acetone or other chemical solvent. Could anyone give > me some idea about it? > > Thanks. > > Peng Jin > _______________________________________________ > mems-talk@memsnet.org mailing list: to unsubscribe or change your list > options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk > Hosted by the MEMS Exchange, providers of MEMS processing services. > Visit us at http://www.mems-exchange.org/ -- ********************************************************* Dr. Paolo Bondavalli R&D Engineer LABCOM - Laboratoire Interconnexions Optiques et MEMS THALES (ex THOMSON-CSF) CORPORATE RESEARCH CENTER Domaine de Corbeville, Route Departementale 128 F91404 ORSAY (FRANCE) Tel : 01 69 33 08 63 Fax : 01 69 33 08 62 Email : Paolo.Bondavalli@thalesgroup.com ********************************************************** Disclaimer: Opinions expressed herein are my own and may not represent those of my employer. ********************************************************** --__--__-- _______________________________________________ mems-talk mailing list mems-talk@memsnet.org http://mail.mems-exchange.org/mailman/listinfo/mems-talk End of mems-talk Digest _______________________________________________ mems-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.mems-exchange.org/