From cgl@nimbus.dartmouth.edu Tue Jan 15 18:09:11 2002 Return-Path: Received: from nimbus.dartmouth.edu (nimbus.dartmouth.edu [129.170.16.33]) by thayer.dartmouth.edu (8.11.6/8.11.6) with ESMTP id g0FN9B612975 for ; Tue, 15 Jan 2002 18:09:11 -0500 Received: (from cgl@localhost) by nimbus.dartmouth.edu (8.9.3/8.9.3) id SAA20910 for microeng@thayer.dartmouth.edu; Tue, 15 Jan 2002 18:09:11 -0500 Received: from kronos.mems-exchange.org (kronos.mems-exchange.org [132.151.8.1]) by nimbus.dartmouth.edu (8.9.3/8.9.3) with ESMTP id OAA13056 for ; Tue, 15 Jan 2002 14:11:38 -0500 Received: from localhost ([127.0.0.1] helo=kronos.mems-exchange.org) by kronos.mems-exchange.org with esmtp (Exim 3.12 #1) id 16QYz9-0004Na-00; Tue, 15 Jan 2002 14:11:03 -0500 Received: from [195.125.154.130] (helo=majestix.suss.de) by kronos.mems-exchange.org with esmtp (Exim 3.12 #1) id 16QXsE-00043v-00 for mems-talk@memsnet.org; Tue, 15 Jan 2002 12:59:51 -0500 Received: by majestix with Internet Mail Service (5.5.2650.21) id ; Tue, 15 Jan 2002 18:55:51 +0100 Message-ID: From: "Runkel, Frank" To: "'mems-talk@memsnet.org'" MIME-Version: 1.0 X-Mailer: Internet Mail Service (5.5.2650.21) Content-Type: text/plain; charset="us-ascii" X-Converted-To-Plain-Text: from multipart/alternative by demime 0.98e X-Converted-To-Plain-Text: Alternative section used was text/plain Subject: [mems-talk] AW: mems-talk digest, Vol 1 #151 - Yanying Feng Sender: mems-talk-admin@memsnet.org Errors-To: mems-talk-admin@memsnet.org X-BeenThere: mems-talk@memsnet.org X-Mailman-Version: 2.0.5 Precedence: bulk Reply-To: mems-talk@memsnet.org List-Help: List-Post: List-Subscribe: , List-Id: General MEMS discussion List-Unsubscribe: , List-Archive: Date: Tue, 15 Jan 2002 18:55:46 +0100 X-Status: X-Keywords: X-UID: 2 Status: RO Hi Yanying, HMDS (hexamethyldisilazane) treatment makes a Si-wafer's surface hydrophobic and can be easily removed with a standard alkaline developer. Thus, the following recipe will lead to the desired pattern of hydrophilic and hydrophobic areas: - HMDS treatment of the Si wafer - resist coating (e.g. AZ 1512) and patterning by optical lithography - resist develop with a standard alkaline developer (e.g. AZ 400K) - resist removal with solvent (e.g. acetone) This is exactly what Marty did when he stripped his exposed wafer (see #154). Frank -------------------------------------------- SUSS MicroTec Applications Center Europe Frank Runkel Schleissheimer Str. 90 85748 Garching Germany Fon +49 89 32007 - 302 Fax +49 89 32007 - 390 email f.runkel@suss.de > Message: 3 > Date: Sun, 13 Jan 2002 20:37:10 +0800 > From: Yanying Feng > To: memsGROUP > Organization: Tsinghua University > Subject: [mems-talk] If there is any method to make some domains > hydrophobic and the > others hydrophilic in microchannels? > Reply-To: mems-talk@memsnet.org > > Dear Lady or Gentlmen: > I want to form some surface pattern of hydrophility in > microchannels.Is there any method to make some domains hydrophobic and the > other hydrophilic in silicon microchannels? The microchannel is > constructed by bonding a silicon substrate with etched channels to a Pyrex > glass coverslip. Thank you any way! > > > With best regards > > Yanying Feng > fengyy@post.pim.tsinghua.edu.cn > ________________________________________________________ > MEMS Lab > Department of Precision Instruments and Mechanology > Tsinghua University > Beijing > P. R. China > 100084 > _________________________________________________________ _______________________________________________ mems-talk@memsnet.org mailing list: to unsubscribe or change your list options, visit http://mail.mems-exchange.org/mailman/listinfo/mems-talk Hosted by the MEMS Exchange, providers of MEMS processing services. Visit us at http://www.mems-exchange.org/