Date: Tue, 16 Aug 1994 19:43:52 -0400 (EDT)
Reply-To: c.levey@Dartmouth.EDU

For sieracki mask (looks darker than ND.3), needed 40 second exposure
at 15mJ/cm2.  The 10s exposure wouldn't develope through in even 3 minutes
(photoresist partially developed is rough and looks black in the microscope).
At 25 seconds there was still some debris in the "clear"
regions.