Ion Beam

Use external ionization source.
• Single Ion Beam
• Dual Ion Beam

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• Type of coating materials : almost any e.g. Ni, Mo, Ti, W, Ai2O3, SiO2
• Ion beam kinetic engergy : 100 to 10,000 eV
• Deposition Pressure : 10^-5 to 10^-2 Pa (10^-7 to 10^-4 torr)
• Deposition temperature: 100 to 500 C
• Coating thickness range: 0.02 to 10 E-6 m
• Deposition rate: 0.02 to 0.5 E-6 m/min
• Relative adhesion : good to excellent

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Advantages:

• Unique coating properties, very high-kinetic energy ion beam may leads to excellent adhesion and high density
• Independent control over kinetic energy and current density of ions
• Directionally control of ion beams
• Low deposition pressure
• High deposition rates
• No gas atom incorporation
• No substrate heating

Disadvantages

• Needs separate ion source
• Substrate size limited because of small ion beam size(~100mm diameter)

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