Triode Sputtering
Triode Sputtering
Increase the number of electrons emmited by cathode by introducing a thermionic electron emmiter (i.e. hot cathode)
- Deposition pressure : 10^-3 to 0.1 Pa (10^-5 to 10^-3 torr)
- Deposition rate : 0.05 to 0.5 E-6 m/min
- Deposition temperature : 100 to 150 C
Comments: - Low deposition pressure, relatively high deposition rates and low substrate temperature
- Nonuniform coating over large surface areas
- Compelexity and difficulties of scaling
- Vulnerability of thermionic emitter to reactive gases
- Shorter filament life
